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pro vyhledávání: '"莫亦先"'
Autor:
Yi-Shien Mor, 莫亦先
91
As the device dimensions continue to shrink, interconnection delay becomes a limiting factor for increasing device speed. Since interconnection delay is the product of the resistance in metal interconnection and the capacitance between the me
As the device dimensions continue to shrink, interconnection delay becomes a limiting factor for increasing device speed. Since interconnection delay is the product of the resistance in metal interconnection and the capacitance between the me
Externí odkaz:
http://ndltd.ncl.edu.tw/handle/24234656187279615523
Autor:
Mor, I-Shien, 莫亦先
86
In this thesis, we will study how to reduce RC time delay. The following investigation is dvided into two major topics. The first topic, we investigate a kind of low dielectric constant materials such as methylsilsesquioxane (MSQ) which is tr
In this thesis, we will study how to reduce RC time delay. The following investigation is dvided into two major topics. The first topic, we investigate a kind of low dielectric constant materials such as methylsilsesquioxane (MSQ) which is tr
Externí odkaz:
http://ndltd.ncl.edu.tw/handle/46416034694156598356