Zobrazeno 1 - 3
of 3
pro vyhledávání: '"胡智恺"'
Publikováno v:
China Brewing; 2023, Vol. 42 Issue 8, p253-259, 7p
Autor:
Chih-Kai, Hu, 胡智愷
106
A numerical procedure was performed to simplify the complicated mechanism of an epitaxial thin-film growth process. In this study, three numerical mechanism models are presented for verifying the growth rate of the gallium nitride (GaN) mech
A numerical procedure was performed to simplify the complicated mechanism of an epitaxial thin-film growth process. In this study, three numerical mechanism models are presented for verifying the growth rate of the gallium nitride (GaN) mech
Externí odkaz:
http://ndltd.ncl.edu.tw/handle/sn376n
Autor:
ZHI-KAI HU, 胡智愷
101
MOCVD is a key process for Light Emitting Diode industry, and the main components in a MOCVD system include reaction chamber, gas control system, MO source system and scrubber. Basically, the reaction chamber connected with the gas supply sy
MOCVD is a key process for Light Emitting Diode industry, and the main components in a MOCVD system include reaction chamber, gas control system, MO source system and scrubber. Basically, the reaction chamber connected with the gas supply sy
Externí odkaz:
http://ndltd.ncl.edu.tw/handle/14987926159899597095