Zobrazeno 1 - 2
of 2
pro vyhledávání: '"王景全 Wang Jing-quan"'
Publikováno v:
ACTA PHOTONICA SINICA. 39:792-796
Based on the models of thin-layer resist exposure and developing,the SPPs resist exposure model is established.Two kinds of resist of AZ1500 and AR3170 are chosen to simulate the process of exposure and developing,and the final profile of SPPs lithog
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::79c94be6db27cf3fa3a9df159483eba0
https://doi.org/10.3788/gzxb20103905.0792
https://doi.org/10.3788/gzxb20103905.0792
Publikováno v:
Chinese Journal of Lasers. 35:39-43
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::984a8742e9c4ca0ee43276b07093c585
https://doi.org/10.3788/cjl20083501.0039
https://doi.org/10.3788/cjl20083501.0039