Zobrazeno 1 - 1
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pro vyhledávání: '"溫凰君"'
Autor:
Huang-Chun Wen, 溫凰君
90
In this thesis, we have proposed a new ultra-shallow junction formation method for nano-MOS technology applications. As device dimension scales down, the short channel effects become more serious. Formation of ultra-shallow junctions is essen
In this thesis, we have proposed a new ultra-shallow junction formation method for nano-MOS technology applications. As device dimension scales down, the short channel effects become more serious. Formation of ultra-shallow junctions is essen
Externí odkaz:
http://ndltd.ncl.edu.tw/handle/80161201359276452221
