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pro vyhledávání: '"涂悅朱"'
Autor:
Yueh-Ju Twu, 涂悅朱
88
In the thesis, we studied two topics. One topic is about high density plasma etching. We employed inductively coupled plasma (ICP) system to study etching rate and sidewall profile of AlGaAs and GaN with various conditions, such as the recipe
In the thesis, we studied two topics. One topic is about high density plasma etching. We employed inductively coupled plasma (ICP) system to study etching rate and sidewall profile of AlGaAs and GaN with various conditions, such as the recipe
Externí odkaz:
http://ndltd.ncl.edu.tw/handle/77998318901971272762
