Zobrazeno 1 - 1
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pro vyhledávání: '"林祐農"'
Autor:
Yu-nung Lin, 林祐農
103
In this thesis we propose a novel mirror-tunable interference lithography system to solve the exposure area limitation in conventional Lloyd''s mirror configuration. The proposed two-beam interference lithography system consists of 4-inch UV
In this thesis we propose a novel mirror-tunable interference lithography system to solve the exposure area limitation in conventional Lloyd''s mirror configuration. The proposed two-beam interference lithography system consists of 4-inch UV
Externí odkaz:
http://ndltd.ncl.edu.tw/handle/kap4e6
