Zobrazeno 1 - 10
of 34
pro vyhledávání: '"李世平"'
Autor:
李世平，王越，郑华光
Publikováno v:
Zhongguo cuzhong zazhi, Vol 18, Iss 10, Pp 1102-1114 (2023)
主观认知下降指患者出现自我感觉认知下降但客观认知检测无异常，是最近研究的热点。近年来，关于主观认知下降的发病率、危险因素、干预治疗等方面的研究逐渐增多。本文汇总了国内
Externí odkaz:
https://doaj.org/article/624662b1c3544a32af46b4e660456809
Publikováno v:
Evaluation & Analysis of Drug-Use in Hospitals of China. 2024, Vol. 24 Issue 6, p685-692. 5p.
Autor:
Shih-Ping Li, 李世平
106
In recent years, with the progress of the computing technology and the storage space, many researchers start to research the field of the Data Mining and the Big Data in order to find the value of numerous data and come up with innovative us
In recent years, with the progress of the computing technology and the storage space, many researchers start to research the field of the Data Mining and the Big Data in order to find the value of numerous data and come up with innovative us
Externí odkaz:
http://ndltd.ncl.edu.tw/handle/tpt3qv
Autor:
李世平, B.W.Dickinson
Publikováno v:
Tongxin xuebao, Vol , Pp 24-39 (1988)
Externí odkaz:
https://doaj.org/article/ef354dd154164018b83a94a0cb36b47d
Autor:
Shih-Ping Lee, 李世平
102
Over the past few decades，the rapid development of the electronics industry contributed to the electronic component distributor in the overall importance of the supply chain。To provide「professional technical support services」 has bec
Over the past few decades，the rapid development of the electronics industry contributed to the electronic component distributor in the overall importance of the supply chain。To provide「professional technical support services」 has bec
Externí odkaz:
http://ndltd.ncl.edu.tw/handle/89620793747796925425
Autor:
Lee, Shih-Ping, 李世平
98
Material and physical properties of silicon nitride (Si3N4) films deposited by plasma enhanced chemical vapor deposition (PECVD) are significantly affected by the gas flow rate of NH3 and SiH4 during the film deposition. When RF power is suff
Material and physical properties of silicon nitride (Si3N4) films deposited by plasma enhanced chemical vapor deposition (PECVD) are significantly affected by the gas flow rate of NH3 and SiH4 during the film deposition. When RF power is suff
Externí odkaz:
http://ndltd.ncl.edu.tw/handle/01060788010781652996
Autor:
lee, sent-ping, 李世平
84
The full-fat soybean grit was used as raw material to study the effects ofprocess parameters on physical and chemical properties of products by using asingle-screw extruder.The process parameters were extruder operating conditions,feed moistu
The full-fat soybean grit was used as raw material to study the effects ofprocess parameters on physical and chemical properties of products by using asingle-screw extruder.The process parameters were extruder operating conditions,feed moistu
Externí odkaz:
http://ndltd.ncl.edu.tw/handle/38438856620686200941
Publikováno v:
Guangdong Architecture Civil Engineering; May2024, Vol. 31 Issue 5, p17-20, 4p
Publikováno v:
Biology Teaching; Feb2024, Vol. 49 Issue 2, p14-17, 4p
Publikováno v:
Chinese Journal of Stroke; Oct2023, Vol. 18 Issue 10, p1102-1114, 13p