Zobrazeno 1 - 8
of 8
pro vyhledávání: '"曹国栋"'
Publikováno v:
Journal of Modern Medicine & Health. 12/30/2024, Vol. 40 Issue 24, p4266-4271. 6p.
Autor:
曹国栋
Publikováno v:
Engineering Management & Technology Discussion; 2024, Vol. 6 Issue 19, p40-42, 3p
Publikováno v:
Journal of Modern Medicine & Health. 6/30/2020, Vol. 36 Issue 12, p1813-1817. 5p.
Publikováno v:
Machine Tool & Hydraulics; Oct2023, Vol. 51 Issue 20, p171-178, 8p
Publikováno v:
Chinese Journal of Computational Mechanics / Jisuan Lixue Xuebao; 2022, Vol. 39 Issue 6, p795-802, 8p
Publikováno v:
Industrial Minerals & Processing / Huagong Kuangwu yu Jiagong; 2021, Vol. 50 Issue 7, p5-13, 5p
Autor:
曹国栋 Cao Guodong, 夏军 Xia Jun, 朱宏伟 Zhu Hongwei, 张霞 Zhang Xia, 陈接华 Chen Jiehua, 王绍明 Wang Shaoming, 蒋永超 Jiang Yongchao
Publikováno v:
Acta Ecologica Sinica. 33:195-204
Soil physical properties of four vegetation types(Tamarix ramosissima,Halostachys caspica,Nitraria sibirica,Salsola spp.) were investigated in the alluvial fan area of Manas River watershed.The main results showed that in the horizontal direction,soi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::30f64c7871fe2c44164d4baa43c2821f
https://doi.org/10.5846/stxb201109201379
https://doi.org/10.5846/stxb201109201379
Autor:
Kuo-tung Tsao, 曹國棟
95
The MIM structure is TaN/HfO2/bottom electrode in this work. Different metals are used as bottom electrode and different plasma treatments after dielectrics deposition are investigated; which include N2, NH3, and H2 plasma treatments. Process
The MIM structure is TaN/HfO2/bottom electrode in this work. Different metals are used as bottom electrode and different plasma treatments after dielectrics deposition are investigated; which include N2, NH3, and H2 plasma treatments. Process
Externí odkaz:
http://ndltd.ncl.edu.tw/handle/12786862128123110304
