Zobrazeno 1 - 4
of 4
pro vyhledávání: '"徐琼芳"'
Publikováno v:
Tianjin Medical Journal. 2024, Vol. 52 Issue 7, p727-732. 6p.
Publikováno v:
Tianjin Medical Journal. Feb2022, Vol. 50 Issue 2, p160-166. 7p.
Autor:
徐琼芳
Publikováno v:
Engineering Management & Technology Discussion; 2024, Vol. 6 Issue 5, p145-147, 3p
Autor:
Chiung Fang Hsu, 徐瓊芳
98
Plasma technology has been widely used in high-tech semiconductor manufacturing, photovoltaic, solar industry and micro electro-mechanical manufacturing. In industry, the most commonly used is inductively coupled plasma (ICP) etching equipmen
Plasma technology has been widely used in high-tech semiconductor manufacturing, photovoltaic, solar industry and micro electro-mechanical manufacturing. In industry, the most commonly used is inductively coupled plasma (ICP) etching equipmen
Externí odkaz:
http://ndltd.ncl.edu.tw/handle/4jhs3s
