Zobrazeno 1 - 3
of 3
pro vyhledávání: '"张存智"'
Publikováno v:
Coal Science & Technology (0253-2336); Nov2021, Vol. 49 Issue 11, p191-199, 9p
Autor:
CUN-ZHI ZHANG, 張存智
103
This paper considers wafer manufacturing of semiconductor where wafer cleaning should be taken to avoid pollution. The function of wafer cleaning is to clean up the dirt, i.e., particle, organic, and metal-lons on the surface of wafer. Thus,
This paper considers wafer manufacturing of semiconductor where wafer cleaning should be taken to avoid pollution. The function of wafer cleaning is to clean up the dirt, i.e., particle, organic, and metal-lons on the surface of wafer. Thus,
Externí odkaz:
http://ndltd.ncl.edu.tw/handle/69278452192339526463
Publikováno v:
China Brewing; 2018, Vol. 37 Issue 10, p171-176, 6p