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pro vyhledávání: '"廖仁懋"'
Autor:
Ren-Mao Liao, 廖仁懋
100
In this study, an organosilicon/silicon oxide (SiOx) thin film prepared using plasma-enhanced chemical vapor deposition (PECVD) using tetramethylsilane (TMS) monomer and TMS-oxygen gas mixture was consecutively deposited onto the flexible pl
In this study, an organosilicon/silicon oxide (SiOx) thin film prepared using plasma-enhanced chemical vapor deposition (PECVD) using tetramethylsilane (TMS) monomer and TMS-oxygen gas mixture was consecutively deposited onto the flexible pl
Externí odkaz:
http://ndltd.ncl.edu.tw/handle/au3k8b
