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Autor:
А.V. Novikov, D. N. Lobanov, А.V. Goryunov, D. V. Yurasov, P. V. Volkov, А.D. Tertyshnik, М.V. Shaleev, А.Yu. Luk'yanov
Publikováno v:
Journal of Crystal Growth. 448:89-92
Differences in heating of silicon and silicon-on-insulator (SOI) substrates in molecular beam epitaxy were revealed by low-coherence tandem interferometry. Using this technique the interference effects which impede the correct evaluation of SOI subst