Zobrazeno 1 - 10
of 65
pro vyhledávání: '"Bruce A. Smith"'
Autor:
Kazuaki Suzuki, Bruce W. Smith
EXPOSURE SYSTEM System Overview of Optical Steppers and Scanners Michael S. Hibbs Optical Lithography Modeling Chris A. Mack Optics for Photolithography Bruce W. Smith Excimer Laser for Advanced Microlithography Palash Das Alignment and Overlay Gregg
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bda2a6360ba0971d432f32d4482e3f0f
https://doi.org/10.1201/9781315117171
https://doi.org/10.1201/9781315117171
Autor:
Han-Hao Cheng, Andrew K. Whittaker, Idriss Blakey, Bruce W. Smith, Lan Chen, Warren Montgomery, Peng Xie, Yong Keng Goh
Publikováno v:
Journal of Polymer Science Part A: Polymer Chemistry. 50:4255-4265
Photon-mediated switching of polymer solubility plays a crucial role in the manufacture of integrated circuits by photolithography. Conventional photoresists typically rely on a single switching mechanism based on either a change in polarity or, mole
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 26:2192-2196
In recent years, the anomalous transmission of subwavelength apertures has become an emergent subject within the physical sciences. While the gain mechanism of these structures is still uncertain, the effect has been observed in several studies. Simi
Autor:
Nicholas J. Turro, Paul M. Zimmerman, Will Conley, Bruce W. Smith, Juan López-Gejo, Joy T. Kunjappu, Jiawang Zhou
Publikováno v:
Chemistry of Materials. 19:3641-3647
In a search for alkane candidates for 193 nm immersion fluids, several alkanes and cycloalkanes were synthesized, purified, and screened to ascertain their absorption at 193 nm, refractive index, a...
Autor:
Bruce W. Smith
Publikováno v:
SPIE Proceedings.
The optimization of illumination in optical lithography has been central to the progress toward λ/5 resolution now commonplace. The tailoring of source shapes to meet increasing demands of imaging has been commercially practiced for over twenty year
Autor:
Bruce W. Smith
Optical projection lithography has been the predominant method of micro- and nano-patterning for most semiconductor and nanotechnology applications. This chapter addresses the approaches, systems, and materials that have been used, as optical lithogr
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6e3f2def9626cc17c2f804930c82450f
https://doi.org/10.1533/9780857098757.1
https://doi.org/10.1533/9780857098757.1
Publikováno v:
Extreme Ultraviolet (EUV) Lithography IV.
Extreme Ultraviolet Lithography (EUVL) at 13.5 nm is currently the most promising technology for advanced integrated circuit (IC) manufacturing nodes. Since the wavelength for EUVL is an order of magnitude smaller than current optical lithography sys
Autor:
Bruce W. Smith
Publikováno v:
SPIE Proceedings.
In this paper, the progression of optical lithography from a spectral (or wavelength) perspective is presented. The interdependencies between materials, sources, design challenges, and scaling are described relative the needs of semiconductor device
Autor:
Emmanuel P. Giannelis, Marie Krysak, Peng Xie, Christopher K. Ober, Markos Trikeriotis, Paul Zimmerman, Bruce W. Smith, Neal Lafferty, Warren Montgomery, Evan L. Schwartz
Publikováno v:
SPIE Proceedings.
We have developed a transparent, high refractive index inorganic photoresist with significantly higher etch resistance than even the most robust polymeric resist. As feature sizes continue to decrease, film thickness must be reduced in order to preve
Autor:
Bruce W. Smith, Burak Baylav, Paul Zimmerman, Chris Scholz, Meng Zhao, Thomas W. Smith, Peng Xie, Ran Yin
Publikováno v:
SPIE Proceedings.
Research has been conducted to develop alternatives to chemically amplified 193 nm photoresist materials that will be able to achieve the requirements associated with sub-32 nm device technology. New as well as older photoresist design concepts for n