Zobrazeno 1 - 10
of 94
pro vyhledávání: '"Bruce A. Smith"'
Autor:
Rajiv N. Sejpal, Bruce W. Smith
Publikováno v:
Photomask Technology 2021.
Alternatives to Ta-based absorbers are being considered for next generation lithography nodes to reduce 3D mask effects and to improve image modulation through phase interference. Low complex refractive index (n – ik) materials can provide phase sh
Autor:
Rajiv N. Sejpal, Bruce W. Smith
Publikováno v:
Journal of Vacuum Science & Technology B. 39:062604
Pattern transfer in an extreme ultraviolet lithography (EUVL) system requires reflective optical elements illuminated at oblique illumination angles. This, in combination with the three-dimensional effects at the mask, is the source of the so-called
Autor:
Bruce W. Smith
The sensitization of photoresist materials has been accomplished by several methods. Adequate adhesion of photoresist to a wafer surface is critical for proper process performance. A photoresist can be dispensed by several methods, including spin coa
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c2e65af56a46b9545bc4925d085313d8
https://doi.org/10.1201/9781315117171-8
https://doi.org/10.1201/9781315117171-8
Publikováno v:
Extreme Ultraviolet (EUV) Lithography XI.
As extreme ultraviolet lithography (EUVL) technology progresses towards and below sub-7nm generations, polarization effects will begin to have an impact. Moving to higher NA will introduce polarization effects at all locations: the mask plane, the op
Autor:
Bruce W. Smith, Lilian Neim
Publikováno v:
International Conference on Extreme Ultraviolet Lithography 2019.
As the extreme ultraviolet (EUV) lithography technology progresses towards and below sub-7nm generations, polarization effects will begin to have an impact. As numerical apertures increase, the consequences at both the mask and the wafer plane need t
Autor:
Bruce R. Smith
Publikováno v:
Face-to-Face in Shakespearean Drama
To face: shifting attention from the noun to the verb changes the dynamics of the interface. To face a person, an object, or a situation is an act of volition. The actor’s own face becomes several things at once: an exteriorization of the actor’s
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2e4add5846f6dc986b2f03beb0daa0f7
https://doi.org/10.3366/edinburgh/9781474435680.003.0002
https://doi.org/10.3366/edinburgh/9781474435680.003.0002
Autor:
Bruce D. Smith
Publikováno v:
Shakespeare | Cut: Rethinking cutwork in an age of distraction
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f67ea1312d82be37e3fff7217510df93
https://doi.org/10.1093/acprof:oso/9780198735526.003.0004
https://doi.org/10.1093/acprof:oso/9780198735526.003.0004
Autor:
Han-Hao Cheng, Andrew K. Whittaker, Idriss Blakey, Bruce W. Smith, Lan Chen, Warren Montgomery, Peng Xie, Yong Keng Goh
Publikováno v:
Journal of Polymer Science Part A: Polymer Chemistry. 50:4255-4265
Photon-mediated switching of polymer solubility plays a crucial role in the manufacture of integrated circuits by photolithography. Conventional photoresists typically rely on a single switching mechanism based on either a change in polarity or, mole
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 26:2116-2120
The degradation of projected images using TM polarization is not intrinsic because losses in image contrast can be recoverable. By controlling the photoresist/substrate interface reflectivity, high modulation for TM polarization can be maintained for
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 26:2192-2196
In recent years, the anomalous transmission of subwavelength apertures has become an emergent subject within the physical sciences. While the gain mechanism of these structures is still uncertain, the effect has been observed in several studies. Simi