Zobrazeno 1 - 10
of 85
pro vyhledávání: '"Bruce A. Smith"'
This chapter addresses general trends and examples of the evolution in advanced lithography methods beyond traditional single patterning technology. The ability to print multiple exposure passes to meet performance targets in a cost-effective manner
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::faf4a71ff60ba093fd93e20f17836ccb
https://doi.org/10.1201/9781315117171-3
https://doi.org/10.1201/9781315117171-3
Autor:
Kazuaki Suzuki, Bruce W. Smith
EXPOSURE SYSTEM System Overview of Optical Steppers and Scanners Michael S. Hibbs Optical Lithography Modeling Chris A. Mack Optics for Photolithography Bruce W. Smith Excimer Laser for Advanced Microlithography Palash Das Alignment and Overlay Gregg
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bda2a6360ba0971d432f32d4482e3f0f
https://doi.org/10.1201/9781315117171
https://doi.org/10.1201/9781315117171
Publikováno v:
Extreme Ultraviolet (EUV) Lithography XI.
As extreme ultraviolet lithography (EUVL) technology progresses towards and below sub-7nm generations, polarization effects will begin to have an impact. Moving to higher NA will introduce polarization effects at all locations: the mask plane, the op
Autor:
Bruce W. Smith, Lilian Neim
Publikováno v:
International Conference on Extreme Ultraviolet Lithography 2019.
As the extreme ultraviolet (EUV) lithography technology progresses towards and below sub-7nm generations, polarization effects will begin to have an impact. As numerical apertures increase, the consequences at both the mask and the wafer plane need t
Autor:
Kazuaki Suzuki, Bruce W. Smith
Publikováno v:
Microlithography: Science and Technology, Second Edition
This new edition of the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from elementary concepts to advanced aspects of modern submicron microlithography. Each chapter
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::867586f78d814e37c1f7fd13dd4431f0
https://doi.org/10.1201/9781420051537
https://doi.org/10.1201/9781420051537
Autor:
Bruce W. Smith, Zac Levinson
Publikováno v:
SPIE Proceedings.
Next-generation EUV lithography systems will use anamorphic optics to achieve high-NA. The well-known Zernike circle polynomials do not describe the sixteen primary aberrations of these anamorphic optical systems though. We propose to use a basis whi
Autor:
Han-Hao Cheng, Andrew K. Whittaker, Idriss Blakey, Bruce W. Smith, Lan Chen, Warren Montgomery, Peng Xie, Yong Keng Goh
Publikováno v:
Journal of Polymer Science Part A: Polymer Chemistry. 50:4255-4265
Photon-mediated switching of polymer solubility plays a crucial role in the manufacture of integrated circuits by photolithography. Conventional photoresists typically rely on a single switching mechanism based on either a change in polarity or, mole
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 26:2192-2196
In recent years, the anomalous transmission of subwavelength apertures has become an emergent subject within the physical sciences. While the gain mechanism of these structures is still uncertain, the effect has been observed in several studies. Simi
Autor:
Chris Maloney, Eric Hendrickx, Rik Jonckheere, Germain Fenger, Bruce W. Smith, Ardavan Niroomand, James Word, Gian Lorusso
Publikováno v:
SPIE Proceedings.
As EUV Lithography (EUVL) continues to evolve, it offers a possible solution to the problems of additional masks and lithography steps that drive up the cost and complexity of 193i multiple patterning. EUVL requires a non-telecentric reflective optic
Autor:
Bruce W. Smith
Publikováno v:
SPIE Proceedings.
The optimization of illumination in optical lithography has been central to the progress toward λ/5 resolution now commonplace. The tailoring of source shapes to meet increasing demands of imaging has been commercially practiced for over twenty year