Zobrazeno 1 - 10
of 11
pro vyhledávání: '"Ji-Sun Kim"'
Publikováno v:
Journal of Nanoscience and Nanotechnology. 19:882-887
Surface modification of SiO₂ supports was shown to significantly affect the properties of Pd/SiO₂ catalysts. The surface of SiO₂ can be modified by various pretreatment methods. In this study, the effect of different calcination temperatures on
Publikováno v:
Materials, Vol 13, Iss 5617, p 5617 (2020)
Materials
Volume 13
Issue 24
Materials
Volume 13
Issue 24
To prevent the contamination of the marine environment caused by ship exhaust gas, the demand for LNG (liquefied natural gas) fueled ships is increasing worldwide. A tank to store LNG at cryogenic temperatures is indispensable to such LNG-fueled ship
Autor:
Yeonhee Hwang, Eunjoo Lee, Hoon-Joo Choi, Chang-sub Park, Jeong-Jae Jo, Ji Soo Kim, Jong-Youb Lim, Ji-Sun Kim
Publikováno v:
Renewable Energy. 79:131-134
Passivated emitter and rear cells (PERC) are considered to be the next-generation silicon solar cell technology because of their significant efficiency gain originating from improved surface passivation and optical reflectivity. However, the complex
Publikováno v:
MATERIALS TRANSACTIONS. 55:1557-1563
Early studies have been conducted on the friction stir welding of steel, tungsten (W), molybdenum (Mo), tungsten carbide, and the like for the production of tools, but the tool materials were significantly worn out and deformed while they were being
Autor:
Stuart Wenham, Hyun-Woo Lee, Jeong-Eun Shin, Soo Hong Lee, Hae-Seok Lee, Jae-Keun Seo, Jisoo Kim, Kyeong-Yeon Cho, Ji-Myung Shim, Keunkee Hong, Brett Hallam, Ji Sun Kim, Eunjoo Lee, Dong-Joon Oh
Publikováno v:
2012 38th IEEE Photovoltaic Specialists Conference.
In this paper we represent three different methods of forming a lightly doped emitter for the fabrication of laser doped selective emitter solar cells on a pilot production line at Shinsung Solar Energy which effectively result in a single-sided diff
Autor:
Hae-Seok Lee, Jeong Eun Shin, Jisoo Kim, Ji Sun Kim, Soo Hong Lee, Ji Myung Shim, Dong Joon Oh, Ji Hyun Kong, Kyeong Yeon Cho, Junyoung Choi, Jae Keun Seo, Eunjoo Lee, Hyun Woo Lee
Publikováno v:
International Journal of Photoenergy, Vol 2012 (2012)
For lower reflectance, we applied a maskless plasma texturing technique using reactive ion etching (RIE) on acidic-textured multicrystalline silicon (mc-Si) wafer. RIE texturing had a deep and narrow textured surface and showed excellent low reflecta
Autor:
Jeong-Eun Shin, Hae-Seok Lee, Jae-Keun Seo, Ji-Sun Kim, Ji-Myung Shim, Dong-Joon Oh, Eunjoo Lee, Soo Hong Lee, Hyun-Woo Lee, J.-H. Kong, Kyeong-Yeon Cho, Junyoung Choi
Publikováno v:
2011 37th IEEE Photovoltaic Specialists Conference.
A high efficiency (η∼18.88 %) mono-crystalline Si solar cell (Area=15.6 × 15.6 cm2) with a selective emitter structure used in the conventional diffusion process (POCl3) and the screen printed contact is presented in this paper. In particular, we
Autor:
Il Hwan Kim, Junyoung Choi, Hyun-Woo Lee, Ji-Myung Shim, Soo Hong Lee, Eunjoo Lee, Hae-Seok Lee, Ji-Sun Kim, Kyeong-Yeon Cho, Jeong-Eun Shin, Dong-Joon Oh
Publikováno v:
2010 35th IEEE Photovoltaic Specialists Conference.
We present a high efficiency (η∼18.5%) mono-crystalline Si solar cells (A=15.6×15.6cm2) with a selective emitter structure using a conventional diffusion process (POCl 3 ) and screen printed contact. Especially, in this paper, we focus on the imp
Autor:
Il Hwan Kim, Hae-Seok Lee, Hyun-Woo Lee, Kyeong-Yeon Cho, Eunjoo Lee, Soo Hong Lee, Junyoung Choi, Dong-Joon Oh, Ji-Sun Kim, Jeong-Eun Shin, Ji-Myung Shim
Publikováno v:
2010 35th IEEE Photovoltaic Specialists Conference.
Aside from having very good optical properties, the good ARC needs passivation effect (Si dangling bonds reduced) and thermal stability (during the firing of screen-printed metal contact). SiNx and SiO 2 are the most popular films as ARC and have bee
Autor:
Hyun-Woo Lee, Ji Myung Shim, Eunjoo Lee, Hae-Seok Lee, Ji Soo Kim, Kyeong Yeon Cho, Soo Jeong Jo, Ji Hyun Kong, Ji-Sun Kim
Publikováno v:
Japanese Journal of Applied Physics. 51:10NA14
To obtain a lower reflectance, we applied a maskless plasma texturing technique by reactive ion etching (RIE) to acid-textured multicrystalline silicon (mc-Si) wafer. RIE texturing produced a deep and narrow textured surface with an excellent low ref