Zobrazeno 1 - 6
of 6
pro vyhledávání: '"WEN-CHING SHIH"'
Publikováno v:
Diamond and Related Materials. 24:188-194
The electron field emission (EFE) process for ultrananocrystalline diamond (UNCD) films was tremendously enhanced by Fe-coating and post-annealing processes. The extent of enhancement changes with the granular structure of the UNCD films and the post
Publikováno v:
Journal of Materials Science: Materials in Electronics. 21:926-931
Carbon nanoflakes (CNFs) with corrugated geometry were synthesized using RF sputtering process with Ar/CH4 gas mixture. Transmission electron microscopic examination reveals that the introduction of H2 in sputtering chamber leads to the preferential
Autor:
Pin-Chang Huang, B. Sundaravel, Wen-Ching Shih, I-Nan Lin, Huang-Chin Chen, L.-J. Lin, B. K. Panigrahi, Chi-Young Lee, S.-C. Lo, Kalpataru Panda
Publikováno v:
Journal of Applied Physics. 113:094305
A thin layer of iron coating and subsequent post-annealing (Fe-coating/post-annealing) is seen to significantly enhance the electron field emission (EFE) properties of ultrananocrystalline diamond (UNCD) films. The best EFE properties, with a turn on
Publikováno v:
Journal of Applied Physics. 112:033708
The interaction between Fe-coatings and ultrananocrystalline diamond (UNCD) films during annealing was investigated in detail using transmission electron microscopy. The thin Fe-coating first formed nanosized Fe-clusters and then catalytically dissoc
Publikováno v:
Japanese Journal of Applied Physics. 50:08KE04
The electron field emission (EFE) properties of diamond films were markedly improved by Fe-coating and postannealing processes. Transmission electron microscopy examination indicated that the possible mechanism of enhancing the EFE behavior is the re
Publikováno v:
Japanese Journal of Applied Physics. 48:081602
Carbon films with flakelike geometry, exhibiting excellent electron field emission (EFE) properties were synthesized by a modified RF sputtering process, which used an Ar:CH4:H2 gas mixture, instead of a conventional Ar:H2 mixture. These films contai