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of 6
pro vyhledávání: '"Piercarlo Mustarelli"'
Publikováno v:
Materials; Volume 9; Issue 4; Pages: 279
Materials
Materials, Vol 9, Iss 4, p 279 (2016)
Materials
Materials, Vol 9, Iss 4, p 279 (2016)
Evolution of pure hydrogen and oxygen by photocatalytic water splitting was attained from the opposite sides of a composite Pt/Ti/TiO2 photoelectrode. The TiO2 films were prepared by radio frequency (RF)-Magnetron Sputtering at different deposition t
Publikováno v:
Journal of Power Sources. 196:10228-10233
Due to easiness of preparation and high energy density, V2O5 nanocrystalline thin films are particularly attractive as cathode materials for all-solid-state rechargeable lithium microbatteries. However, their electrochemical performances are strictly
Autor:
Gaetano Chiodelli, Eliana Quartarone, Vincenzo Massarotti, Piercarlo Mustarelli, Lorenzo Malavasi
Publikováno v:
Solid State Ionics. 176:1505-1512
Polycrystalline samples and thin films of the x = 0.8 member of the Ce x Gd 1− x O 2− y solid solution have been successfully prepared. Their structural and transport properties have been studied by means of X-ray diffraction and electrical condu
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 22:2234-2238
Radio frequency sputtering is a reliable and low-cost technique for the deposition of oxide thin films. Here we report on the nonreactive preparation of SiO2 and SiO2–GeO2 films, which can be of interest in optics and optoelectronics. The depositio
Publikováno v:
25 (2007): 485–491.
info:cnr-pdr/source/autori:Quartarone, E; Mustarelli, P; Grandi, S; Marabelli, F; Bontempi, E/titolo:Effects of the deposition parameters on the growth of ultrathin and thin SiO2 films/doi:/rivista:/anno:2007/pagina_da:485/pagina_a:491/intervallo_pagine:485–491/volume:25
Università degli Studi di Brescia-IRIS
info:cnr-pdr/source/autori:Quartarone, E; Mustarelli, P; Grandi, S; Marabelli, F; Bontempi, E/titolo:Effects of the deposition parameters on the growth of ultrathin and thin SiO2 films/doi:/rivista:/anno:2007/pagina_da:485/pagina_a:491/intervallo_pagine:485–491/volume:25
Università degli Studi di Brescia-IRIS
SiO2 ultrathin and thin films have been deposited on single-crystal Si substrates by means of nonreactive radio frequency magnetron sputtering. The temperature of the substrate and the deposition times have been varied in the range of 200-500 degrees
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::0ac9d80114eaf60116fc80e97a636e46
https://publications.cnr.it/doc/167161
https://publications.cnr.it/doc/167161
Autor:
Piercarlo Mustarelli, Aldo Magistris, Ilaria Fratoddi, Mv Russo, Anita Furlani, Eliana Quartarone
A thin film of poly( N , N -dimethylpropargylamine) (PDMPA), deposited by spin coating over a SiO 2 substrate covered by an interdigitated array of chromium electrodes, was characterised by impedance spectroscopy at different relative humidity levels
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::5749a1e95b9b28026d57be550f9a83a4
http://hdl.handle.net/11573/248968
http://hdl.handle.net/11573/248968