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pro vyhledávání: '"Dongyoung Lee"'
Autor:
Minhyung Hong, Jieun Lee, Guy Ben-Dov, Young-Sik Kim, Eitan Hajaj, Seungyoung Kim, Yoonshik Kang, Dana Klein, Anna Golotsvan, Dongyoung Lee, Ahlin Choi, Saltoun Lilach, Eungryong Oh, Tal Marciano, Dan Serero, Kyuchan Shim, Sangjoon Han, Aharon Sharon, Honggoo Lee
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXXII.
As semiconductor manufacturing technology progresses and the dimensions of integrated circuit elements shrink, overlay budget is accordingly being reduced. Overlay budget closely approaches the scale of measurement inaccuracies due to both optical im
Autor:
Irina Brinster, Dongyoung Lee, Dongsub Choi, Honggoo Lee, Jaeson Woo, Hoyoung Heo, Chang-Rock Song, Sangjun Han, John C. Robinson
Publikováno v:
SPIE Proceedings.
Overlay control based on DI metrology of optical targets has been the primary basis for run-to-run process control for many years. In previous work we described a scenario where optical overlay metrology is performed on metrology targets on a high fr