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pro vyhledávání: '"Ruixuan Wu"'
Autor:
Rui Chen, Yajuan Su, Ruixuan Wu, Ying Chen, Lisong Dong, Yayi Wei, Le Ma, Yibo Lin, Tianyang Gai
Publikováno v:
Optics express. 28(12)
Extreme ultraviolet (EUV) lithography mask defects may cause severe reflectivity deformation and phase shift in advanced nodes, especially like multilayer defects. Geometric parameter characterization is essential for mask defect compensation or repa