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pro vyhledávání: '"J.P. Stoquert"'
Publikováno v:
Laser Ablation Mechanisms and Applications ISBN: 9780387977317
Applied Surface Science
Applied Surface Science, Elsevier, 1992, 54, pp.180-186
Applied Surface Science
Applied Surface Science, Elsevier, 1992, 54, pp.180-186
Silicon oxide films are deposited by laser ablation from silicon, silicon monoxide and silicon dioxide (quartz) targets, performed under vacuum and in oxygen atmosphere, with a high power pulsed ArF (λ = 193 nm) excimer laser. The specific influence
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::9cdbf5035882c9d418a0edf457ab0e5a
https://doi.org/10.1007/bfb0048351
https://doi.org/10.1007/bfb0048351