Zobrazeno 1 - 10
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pro vyhledávání: '"Bruce A. Smith"'
Autor:
Bruce D. Smith
Publikováno v:
2016 IEEE Nuclear Science Symposium, Medical Imaging Conference and Room-Temperature Semiconductor Detector Workshop (NSS/MIC/RTSD).
Smoothing is desirable in tomographic imaging when it reduces the effects of noise in the data and is undesirable when it smooths a small feature such as a tumor or a lesion so much that they become undetectable. Linear algebra can be used to identif
Publikováno v:
PervasiveHealth
This two-year project aims to investigate in detail how prompting can help to guide people with dementia through tasks independently in a domestic setting. Four formats of prompt (text, audio, video and picture) are being compared with each other dur
Autor:
J. Tierney, Santosh K. Kurinec, M. Wiegand, R.L. Lane, R.E. Pearson, S. Widlund, Karl D. Hirschman, Lynn Fuller, Sean L. Rommel, S.P. Blondell, M.A. Jackson, Bruce W. Smith, Dale E. Ewbank, M. Arquette, C. Gruener
Publikováno v:
2006 16th Biennial University/Government/Industry Microelectronics Symposium.
Rochester Institute of Technology started the nation's first Bachelor of Science program in Microelectronic Engineering in 1982. The program has kept pace with the rapid advancements in semiconductor technology, sharing 25 of the 40 years characteriz
Autor:
R.E. Pearson, Lynn Fuller, M.A. Jackson, I.R. Turkman, Bruce W. Smith, S.K. Kurinec, R.L. Lane
Publikováno v:
Proceedings. IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop.
Publikováno v:
Proceedings., Eighth University/Government/Industry Microelectronics Symposium.
Several new processing capabilities have recently been commissioned in the RIT (Rochester Institute of Technology) microelectronic engineering laboratory. These include: (1) ion implantation; (2) LPCVD (low-pressure chemical vapor deposition) polysil
Publikováno v:
Proceedings., Eighth University/Government/Industry Microelectronics Symposium.
Describes the topics covered by Microlithography I and II laboratories and the Advanced Microelectronic Chemistry Laboratory at the Rochester Institute of Technology. Involvement in Microlithography I lab introduces the students to photoresist applic
Autor:
Santosh K. Kurinec, R.E. Pearson, S.P. Blondell, Lynn Fuller, I.R. Turkham, Bruce W. Smith, G.A. Runkle, R.L. Lane, K.H. Hesler
Publikováno v:
Proceedings., Eighth University/Government/Industry Microelectronics Symposium.
The authors describe the systems that have been established for the operation of the microelectronics facility at the Rochester Institute of Technology. Attention is given to the organizational structure; support facilities; cleanroom maintenance; la
Autor:
Santosh K. Kurinec, I.R. Turkman, Bruce W. Smith, R.L. Lane, K.H. Hesler, R.E. Pearson, Lynn Fuller
Publikováno v:
Proceedings., Eighth University/Government/Industry Microelectronics Symposium.
Rochester Institute of Technology, College of Engineering, has established a new master of engineering degree program in microelectronics manufacturing engineering. The program is one year (four quarters) in duration and is designed for BS graduates
Autor:
Santosh K. Kurinec, M.A. Jackson, I.R. Turkman, Bruce W. Smith, R.E. Pearson, Lynn Fuller, R.L. Lane
Publikováno v:
[1993] Proceedings of the Tenth Biennial University/Government/Industry Microelectronics Symposium.
The microelectronic engineering program at Rochester Institute of Technology (RIT) is the only ABET accredited B.S. Microelectronic Engineering program in the United States. The program requires co-op, making it five years in length. Co-op students a
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