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Autor:
Bernard Gallez, Stéphane Lucas, Olivier Feron, Thierry Vander Borght, Bernard Masereel, Francois Rossi, Carine Michiels, Nicolas Moreau
Publikováno v:
Surface and Coatings Technology. 205(SUPPL. 2):462-465
In this work, we investigate the surface reactivity of substrates coated with thin layers (estimated thickness ≤30nm) of plasma polymerized allylamine films (PPAA), an amine-functionalized polymer deposited by plasma-enhanced chemical vapor deposit
Publikováno v:
Surface and Coatings Technology, 204(1-2), 78-84. Elsevier
Plasma Enhanced Chemical Vapor Deposition (PECVD) was used to grow 200, 300 and 400 nm thick silicon nitride layers (SiN x ) on a high temperature aromatic polyester substrate spin coated with a silica-acrylate hybrid coating (hard coat). Layers depo