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pro vyhledávání: '"Kapil Gupta"'
Publikováno v:
Scientific Reports, Vol 7, Iss 1, Pp 1-6 (2017)
Abstract 1.5-μm AlN grown by metal-organic chemical vapor deposition (MOCVD), with a single substrate temperature of 1180 °C, exhibits atomically flat surface and the XRD (102) peak width of 427 arcsec. The results are achieved with a pulsed NH3-fl
Externí odkaz:
https://doaj.org/article/b393a420061f4e99ae006e9367826f16
Publikováno v:
Scientific Reports, Vol 8, Iss 1, Pp 1-1 (2018)
A correction to this article has been published and is linked from the HTML and PDF versions of this paper. The error has been fixed in the paper.
Externí odkaz:
https://doaj.org/article/828e776e09514dfea7d6275871796156
Publikováno v:
Scientific Reports, Vol 7, Iss 1, Pp 1-6 (2017)
Scientific Reports
Scientific Reports
1.5-μm AlN grown by metal-organic chemical vapor deposition (MOCVD), with a single substrate temperature of 1180 °C, exhibits atomically flat surface and the XRD (102) peak width of 427 arcsec. The results are achieved with a pulsed NH3-flow condit
Publikováno v:
Scientific Reports, Vol 8, Iss 1, Pp 1-1 (2018)
Scientific Reports
Scientific Reports
1.5-μm AlN grown by metal-organic chemical vapor deposition (MOCVD), with a single substrate temperature of 1180 °C, exhibits atomically flat surface and the XRD (102) peak width of 427 arcsec. The results are achieved with a pulsed NH