Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Dongyoung Lee"'
Autor:
Moran Zaberchik, Scott Beatty, Sanghuck Jeon, Nir BenDavid, Chanha Park, Sang Ho Lee, Dongsub Choi, Dongyoung Lee, Telly Koffas, Chen Li, Ramkumar Karur-Shanmugam, Dongsoo Kim, Honggoo Lee, Jae Young Park, Hedvi Spielberg, Efi Megged, Dohwa Lee
Publikováno v:
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV.
We developed a statistical method that can be applied to overlay metrology tools to improve performance and time-to-results (TTR) of multi-cycle optimization based on the brute force method. First, we evaluated full response surfaces for each combina
Autor:
Seung-Uk Jeong, Sotirios Tsiachris, Jeongwoo Jae, Dongyoung Lee, Chih-Hung Hsieh, Gwang-Gon Kim, Yuna Park, Ji-Hoon Jung, Kyoyeon Cho, Abdalmohsen Elmalk, Chanha Park, Nang-Lyeom Oh, Taekwon Jee, Gratiela Isai, Jungchan Kim, JaeYoung Park, Won-Kwang Ma, Ewa Kasperkiewicz, Rizvi Rahman, Anita Bouma, Sang Ho Lee, WeiTai Lin, Kuo-Feng Pao, Jae-Doug Yoo, Jonggeun Won, Sudharshanan Raghunathan, Hsin-Yu Chen, Kuan-Ming Chen, Sang-Woo Kim, Wolfgang Henke
Publikováno v:
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV.
In this paper, budget characterization and wafer mapping of the Edge Placement Error (EPE) is studied to manage and improve pattern defects with a use case selected from SK Hynix’s most advanced DRAM 1x nm product. To quantify EPE, CD and overlay w
Autor:
Chanha Park, Xiaolei Liu, Dongyoung Lee, Chen Dror, Eltsafon Ashwal, Dongsoo Kim, Sanghuck Jeon, Zephyr Liu, Katya Gordon, Honggoo Lee, Eitan Hajaj, Mark Ghinovker, Diana Shaphirov, Sang-Ho Lee, Dongsub Choi, Dohwa Lee, Raviv Yohanan
Publikováno v:
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV.
Reduction in on product overlay (OPO) is a key component for high-end, high yield integrated circuit manufacturing. Due to the continually shrinking dimensions of the IC device elements it has become near-impossible to measure overlay on the device i