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Autor:
Sa. K. Narayandass, S. Venkatachalam, D. Mangalaraj, R. Kesavamoorthy, B. Karunagaran, R.T. Rajendra Kumar
Publikováno v:
Materials Letters. 57:3820-3825
V2O5 films were deposited on silicon (111) substrates by vacuum evaporation technique at various deposition temperatures of 300, 473, 573, 623 and 673 K. X-ray characterization revealed that the films deposited at Ts≤473 K are amorphous and the fil