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Publikováno v:
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 31:031602
Air bubble defects have been regarded as a critical problem in ultraviolet (UV)-based imprinting/embossing processes, especially in large area fabrication. This paper reports a gas-assisted UV embossing process for bubble-free replication of large ar