Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Dep Scheikunde"'
Autor:
Voncken, M.M.A.J., Schermer, J.J., van Niftrik, A.T.J., Bauhuis, G.J., Mulder, P., Larsen, P.K., Peters, T.P.J., de Bruin, B., Klaassen, A., Kelly, J.J., Chemie van de vaste stof: Luminescentie en elektrochemie, Universiteit Utrecht, Dep Scheikunde
Publikováno v:
Journal of the Electrochemical Society, 151, G347-G352
Journal of the Electrochemical Society, 151(5), G347. Electrochemical Society, Inc.
Journal of the Electrochemical Society, 151, pp. G347-G352
Journal of the Electrochemical Society, 151, 5, pp. G347-G352
Journal of the Electrochemical Society, 151(5), G347. Electrochemical Society, Inc.
Journal of the Electrochemical Society, 151, pp. G347-G352
Journal of the Electrochemical Society, 151, 5, pp. G347-G352
Contains fulltext : 58516.pdf (Publisher’s version ) (Open Access) The epitaxial lift- off process allows the separation of a thin layer of III/ V material from the substrate by selective etching of an intermediate AlAs layer with HF. In a theory p
Autor:
Di Vece, M., van der Sluis, P., Janner, A.-M., Kelly, J.J., Chemie van de vaste stof: Luminescentie en elektrochemie, Universiteit Utrecht, Sub Physics of devices begr 1/1/17, Dep Scheikunde, Sub Condensed Matter and Interfaces
Publikováno v:
Journal of the Electrochemical Society, 149(10), G576. Electrochemical Society, Inc.
A significant chemical stability has allowed us to perform photoelectrochemical measurements on the semiconducting state of the GdMg hydride system. With electrical impedance spectroscopy we confirm that GdMg hydride in the transparent state is an n-
Publikováno v:
Journal of the Electrochemical Society, 154, D629-D635
Journal of the Electrochemical Society, 154, 11, pp. D629-D635
Journal of the Electrochemical Society, 154, 11, pp. D629-D635
In the present work a so-called diffusion and reaction related model (DR model) is derived based on the notion that the overall etch rate in the epitaxial lift-off (ELO) process is determined both by the diffusion rate of hydrofluoric acid to the etc