Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Wang, Xiaofeng"'
Publikováno v:
Journal of Semiconductors. 36:123004
A self-aligned process to fabricate a "metal-quantum dot-metal" structure is presented, based on an "electron beam lithography, thin film deposition and dry etching process". The sacrificial layers used can improve the lift-off process, and novel lit
Autor:
Song Zhi-Tang, Liu Bo, Chen Xiao-Gang, Wang Xiaofeng, Ma Huili, Zhang Jiayong, Cheng Kaifang, Feng Song-Lin, Wang Xiaodong, Yang Fuhua
Publikováno v:
Journal of Semiconductors. 32:046001
An electroless deposition (ELD) method is introduced to fabricate a metal nanoplug for its advantages of simplicity, low cost and auto-selectivity. It was demonstrated that nanoplugs of less than 50 nm in diameter can be fabricated by ELD nickel on v
Publikováno v:
Journal of Semiconductors. 30:096003
A lithography-independent and wafer scale method to fabricate a metal nanogap structure is demonstrated. Polysilicon was first dry etched using photoresist (PR) as the etch mask patterned by photolithography. Then, by depositing conformal SiO2 on the