Zobrazeno 1 - 2
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pro vyhledávání: '"Komuro, A."'
Autor:
Keigo Takeda, Hiroki Kondo, Tatsuya Komuro, Kenji Ishikawa, Tsuyoshi Yamaguchi, Makoto Sekine, Masaru Hori, Chishio Koshimizu, Seigo Takashima
Publikováno v:
Journal of Physics D: Applied Physics. 45:025203
Superpositioning of negative dc bias in dual-frequency capacitively coupled plasmas (dc-superposed (DS)-CCP) was realized for the selective etching of carbon-doped silicon oxide (SiOCH) films over carbon-doped amorphous silicon (SiC) films, while the
Publikováno v:
Journal of Physics D: Applied Physics; Apr2009, Vol. 42 Issue 8, p085109-085109, 1p