Zobrazeno 1 - 9
of 9
pro vyhledávání: '"Bruce A. Smith"'
Autor:
Andrew Burbine, Bruce W. Smith, Zac Levinson, Kenneth A. Goldberg, Obert Wood, Erik Verduijn, Antoine Wojdyla, Markus P. Benk
Publikováno v:
Levinson, Z; Burbine, A; Verduijn, E; Wood, O; Goldberg, KA; Benk, MP; et al.(2017). Image-based pupil plane characterization via a space-domain basis. Journal of Micro/ Nanolithography, MEMS, and MOEMS, 16(2). doi: 10.1117/1.JMM.16.2.023509. Lawrence Berkeley National Laboratory: Retrieved from: http://www.escholarship.org/uc/item/5j99929s
Journal of Micro/Nanopatterning Materials and Metrology, vol 16, iss 2
Journal of Micro/ Nanolithography, MEMS, and MOEMS, vol 16, iss 2
Journal of Micro/Nanopatterning Materials and Metrology, vol 16, iss 2
Journal of Micro/ Nanolithography, MEMS, and MOEMS, vol 16, iss 2
© 2017 Society of Photo-Optical Instrumentation Engineers (SPIE). Aberration characterization plays a critical role in the development of any optical system. State-of-the-art lithography systems have the tightest aberration tolerances. We present an
Publikováno v:
Journal of Micro/Nanolithography, MEMS, and MOEMS. 12:043001
Extreme ultraviolet lithography (EUVL) at 13.5 nm is currently the most promising technology for advanced integrated circuit manufacturing nodes. Since the wavelength for EUVL is an order of magnitude smaller than current optical lithography systems
Autor:
Peng Xie, Bruce W. Smith
Publikováno v:
Journal of Micro/Nanolithography, MEMS, and MOEMS. 12:013011
In this paper, we report progress in developing a scanning evanescent wave lithography (EWL) imaging head with a twostage gap control system including a DC noise canceling carrying air bearing that floats at a constant air gap with regulated air pres
Autor:
Monica Kempsell Sears, Bruce W. Smith
Publikováno v:
Journal of Micro/Nanolithography, MEMS, and MOEMS. 12:013008
An aerial image model is used to study the effects of spherical aberration applied in the lens pupil domain of a lithography projection scanner. These effects include the illumination dependency of focus exposure matrix tilt and the linear relationsh
Autor:
Geert Vandenberghe, Eric Hendrickx, Bruce W. Smith, Kyohei Sakajiri, Monica Laurel Kempsell, Susuki Yoshitake, Yuri Granik, Alexander Tritchkov, Kenichi Yasui
Publikováno v:
Journal of Micro/Nanolithography, MEMS, and MOEMS. 8:043001
Inverse lithography technology (ILT) is a procedure that optimizes the mask layout to produce an image at the wafer with the targeted aerial image. For an illumination condition optimized for dense pitches, ILT inserts model-based subresolution assis
Autor:
Bruce W. Smith
Publikováno v:
Journal of Micro/Nanolithography, MEMS, and MOEMS. 8:021207
A small-scale interferometric EUV exposure system is presented, based on Talbot interferometric imaging. In this approach, illuminated EUV grating mask orders are recombined remotely through reflection, resulting in interference with spatial preserva
Publikováno v:
Journal of Micro/Nanolithography, MEMS, and MOEMS. 4:031107
Degradation in image contrast becomes a concern at higher numerical apertures (NAs) due to mask-induced polarization effects. We study how different photomask materials (binary and attenuated phase shift), feature sizes and shapes, pitch values, duty
Autor:
Neal Lafferty, Lena Zavyalova, Hoyoung Kang, Anatoly Bourov, Yongfa Fan, Frank Cropanese, Bruce W. Smith
Publikováno v:
Journal of Micro/Nanolithography, MEMS, and MOEMS. 3:44
Historically, the application of immersion optics to microlitho-graphy has not been seriously pursued because of the alternative technologies available. As the challenges of shorter wavelength become increasingly difficult, immersion imaging becomes
Autor:
Bruce W. Smith
Publikováno v:
Journal of Micro/Nanolithography, MEMS, and MOEMS. 1:95
As subhalf wavelength optical lithography is pursued, the variety of imaging requirements increases. This can result in complex combinations of various resolution enhancement techniques. Optimization based on simple standards or rules is not possible