Zobrazeno 1 - 9
of 9
pro vyhledávání: '"Komuro, A."'
Autor:
A. Yamaguchi, Osamu Komuro
Publikováno v:
Japanese Journal of Applied Physics. 42:3763-3770
With decreasing minimum feature: size of circuit geometry in LSIs, the effect of line edge roughness (LER) of resist patterns on the device performance is becoming a serious problem. The degree of LER, which is defined as a (standard deviation) or 3/
Publikováno v:
Japanese Journal of Applied Physics. 42:3871-3873
To evaluate the ultimate accuracy in nanoimprint replication using photocurable resin, we studied the line edge roughness (LER) of replicated patterns using a mold pattern on a Si (110) substrate produced by anisotropic wet etching. The root mean squ
Publikováno v:
Japanese Journal of Applied Physics. 44:5622
Well-shaped patterns were fabricated by photo-nanoimprinting using a spin-on-glass (SOG) mold, the patterns of which were replicated from a Si master mold by the SOG replica method. The line width reproducibility of the photo-nanoimprint was then eva
Publikováno v:
Japanese Journal of Applied Physics. 43:3967
A new detection method for a T-topped profile in resist patterns is proposed. This method can determine a T-topped tendency from only a single top-down critical dimension scanning electron microscope (CD-SEM) image. The method is based on the relatio
Publikováno v:
Japanese Journal of Applied Physics. 43:4012
An active orientation head was designed and installed into a step-and-repeat photo-nanoimprint system. The characteristics of the passive part of the active orientation head and compliant contact function as a basic function were evaluated. Feedback
Publikováno v:
Japanese Journal of Applied Physics. 33:7053
Observation of surface change with etching reaction for the Si(111)/XeF2 system has been demonstrated using second-harmonic generation (SHG). Both of the p-polarized and the s-polarized SHG outputs decay quickly with the spontaneous etching because o
Publikováno v:
Japanese Journal of Applied Physics. 33:4691
Laser removal of fingerprints from glass and quartz surfaces was studied using laser irradiation in air. The KrF excimer laser, continuous wave (CW) CO2 laser and pulsed CO2 laser were used in the investigation. Electron probe microanalysis (EPMA) wa
Publikováno v:
Japanese Journal of Applied Physics. 27:L2105
Fe/Co multilayer films with various Fe layer and Co layer thicknesses ( dFe, dCo) were deposited by an rf magnetron sputtering method. The bcc single phase was obtained for films with smaller thicknesses of Co than 2 nm. A mixture of bcc and hcp phas
Publikováno v:
Japanese Journal of Applied Physics. 26:L84
Thin 200-nm-thick Si crystals were grown in Si layers amorphized with 800-keV As2+ ions by inducing lateral solid-phase epitaxy at 500°C with a 140-keV Si2+ psuedo-linear ion beam formed by scanning a point-focused beam at 5 kHz. It is shown that re