Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Komuro, A."'
Autor:
Hiroshi Hiroshima, Masanori Komuro
Publikováno v:
Japanese Journal of Applied Physics. 46:6391-6394
We studied UV nanoimprint in air and the elimination of bubble defects using pentafluoropropane, which has a vapor pressure of 0.15 MPa at 25 °C. Bubble defects are unavoidable when UV nanoimprint is carried out in air. Pillars fabricated in thin re
Publikováno v:
Scopus-Elsevier
We studied generation mechanism of bubble defects in air using molds having many recessed square patterns and photo-curable liquid polymer with a viscosity of 64 mPa s. The liquid polymer films with an initial thickness of 620–2000 nm were pressed
Publikováno v:
Japanese Journal of Applied Physics. 42:3871-3873
To evaluate the ultimate accuracy in nanoimprint replication using photocurable resin, we studied the line edge roughness (LER) of replicated patterns using a mold pattern on a Si (110) substrate produced by anisotropic wet etching. The root mean squ
Publikováno v:
Japanese Journal of Applied Physics. 43:4022
When we apply a photocurable polymer to photo-nanoimprint lithography, dry etching is necessary to remove the remaining photocurable polymer after imprinting. During dry etching, it is necessary to achieve pattern profiles with small pattern shrinkag