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Autor:
O. Groening, V. Semet, Didier Pribat, William I. Milne, Gehan A. J. Amaratunga, G. Pirio, Kenneth B. K. Teo, Vu Thien Binh, A. Loiseau, M. Castignolles, Pierre Legagneux, J. P. Schnell, Haroon Ahmed, Seung-Beck Lee, David G. Hasko, Manishkumar Chhowalla, L. Gangloff
Publikováno v:
Diamond and Related Materials. 12:422-428
Plasma enhanced chemical vapour deposition (PECVD) is a controlled technique for the production of vertically aligned multiwall carbon nanotubes for field emission applications. In this paper, we investigate the electrical properties of individual ca