Zobrazeno 1 - 10
of 17
pro vyhledávání: '"Cho, Eunseog"'
Autor:
Lee YJ; Spectroscopy Laboratory for Functional π-Electronic Systems and Department of Chemistry, Yonsei University, Seoul, 03722, South Korea., Kim S; Samsung Advanced Institute of Technology, Samsung Electronics, Suwon, 16678, South Korea., Lee J; Samsung Advanced Institute of Technology, Samsung Electronics, Suwon, 16678, South Korea., Cho E; CSE Team, Samsung Electronics, Hwaseong, 18848, South Korea., Won YH; Samsung Advanced Institute of Technology, Samsung Electronics, Suwon, 16678, South Korea., Kim T; Samsung Advanced Institute of Technology, Samsung Electronics, Suwon, 16678, South Korea., Kim D; Spectroscopy Laboratory for Functional π-Electronic Systems and Department of Chemistry, Yonsei University, Seoul, 03722, South Korea.
Publikováno v:
Advanced materials (Deerfield Beach, Fla.) [Adv Mater] 2024 Apr; Vol. 36 (16), pp. e2311719. Date of Electronic Publication: 2024 Jan 16.
Autor:
Cho E; CSE Team, Samsung Electronics, 1 Samsungjeonja-ro, Hwaseong-si, Gyeonggi-do, 18448, Republic of Korea. eunseog.cho@samsung.com., Son WJ; CSE Team, Samsung Electronics, 1 Samsungjeonja-ro, Hwaseong-si, Gyeonggi-do, 18448, Republic of Korea. wonjoon.son@samsung.com., Cho E; CSE Team, Samsung Electronics, 1 Samsungjeonja-ro, Hwaseong-si, Gyeonggi-do, 18448, Republic of Korea., Jang I; CSE Team, Samsung Electronics, 1 Samsungjeonja-ro, Hwaseong-si, Gyeonggi-do, 18448, Republic of Korea., Kim DS; CSE Team, Samsung Electronics, 1 Samsungjeonja-ro, Hwaseong-si, Gyeonggi-do, 18448, Republic of Korea., Min K; School of Mechanical Engineering, Soongsil University, 369 Sangdo-ro, Dongjak-gu, Seoul, 06978, Republic of Korea. kmin.min@ssu.ac.kr.
Publikováno v:
Scientific reports [Sci Rep] 2023 Oct 10; Vol. 13 (1), pp. 17145. Date of Electronic Publication: 2023 Oct 10.
Autor:
Stewart RJ; Science and Technology Division, Corning Incorporated, Corning, New York 14831, USA., Goyal S; Science and Technology Division, Corning Incorporated, Corning, New York 14831, USA., Lee SH; Corning Technology Center Korea, Asan, Chungcheongnam-do 31454, South Korea., Rammohan A; Science and Technology Division, Corning Incorporated, Corning, New York 14831, USA., Park HH; Corning Technology Center Korea, Asan, Chungcheongnam-do 31454, South Korea., Min K; Platform Technology Lab, Samsung Advanced Institute of Technology, 130 Samsung-ro, Suwon, Gyeonggi-do 443-803, South Korea., Cho E; Platform Technology Lab, Samsung Advanced Institute of Technology, 130 Samsung-ro, Suwon, Gyeonggi-do 443-803, South Korea., Heinz H; Department of Chemical and Biological Engineering, University of Colorado at Boulder, Boulder, Colorado 80309, USA.
Publikováno v:
The Journal of chemical physics [J Chem Phys] 2019 May 07; Vol. 150 (17), pp. 174703.
Publikováno v:
ACS applied materials & interfaces [ACS Appl Mater Interfaces] 2018 Oct 31; Vol. 10 (43), pp. 37498-37506. Date of Electronic Publication: 2018 Oct 19.
Autor:
Min K; Platform Technology Lab, Samsung Advanced Institute of Technology, 130 Samsung-ro, Suwon, Gyeonggi-do 16678, Republic of Korea. kmin.min@samsung.com eunseog.cho@samsung.com., Cho E
Publikováno v:
Physical chemistry chemical physics : PCCP [Phys Chem Chem Phys] 2018 Oct 31; Vol. 20 (42), pp. 27115-27124.
Autor:
Min K; Platform Technology Lab, Samsung Advanced Institute of Technology, 130 Samsung-ro, Suwon, Gyeonggi-do, 16678, Republic of Korea. kmin.min@samsung.com., Choi B; Energy Lab, Samsung Advanced Institute of Technology, 130 Samsung-ro, Suwon, Gyeonggi-do, 16678, Republic of Korea., Park K; Department of Mechanical Engineering, Gachon University, 1342 Seongnamdaero, Gyeonggi-do, 13120, Republic of Korea., Cho E; Platform Technology Lab, Samsung Advanced Institute of Technology, 130 Samsung-ro, Suwon, Gyeonggi-do, 16678, Republic of Korea. eunseog.cho@samsung.com.
Publikováno v:
Scientific reports [Sci Rep] 2018 Oct 25; Vol. 8 (1), pp. 15778. Date of Electronic Publication: 2018 Oct 25.
Autor:
Min K; Platform Technology Lab , Samsung Advanced Institute of Technology , 130 Samsung-ro , Suwon , Gyeonggi-do 16678 , Republic of Korea., Jung C; Platform Technology Lab , Samsung Advanced Institute of Technology , 130 Samsung-ro , Suwon , Gyeonggi-do 16678 , Republic of Korea., Ko DS; Platform Technology Lab , Samsung Advanced Institute of Technology , 130 Samsung-ro , Suwon , Gyeonggi-do 16678 , Republic of Korea., Kim K; Platform Technology Lab , Samsung Advanced Institute of Technology , 130 Samsung-ro , Suwon , Gyeonggi-do 16678 , Republic of Korea., Jang J; Platform Technology Lab , Samsung Advanced Institute of Technology , 130 Samsung-ro , Suwon , Gyeonggi-do 16678 , Republic of Korea., Park K; Department of Mechanical Engineering , Gachon University , 1342 Seongnamdaero, Sujeong-gu , Seongnam-si , Gyeonggi-do 13120 , Republic of Korea., Cho E; Platform Technology Lab , Samsung Advanced Institute of Technology , 130 Samsung-ro , Suwon , Gyeonggi-do 16678 , Republic of Korea.
Publikováno v:
ACS applied materials & interfaces [ACS Appl Mater Interfaces] 2018 Jun 20; Vol. 10 (24), pp. 20599-20610. Date of Electronic Publication: 2018 Jun 11.
Autor:
Min K; Platform Technology Lab, Samsung Advanced Institute of Technology, 130 Samsung-ro, Suwon, Gyeonggi-do 16678, Republic of Korea. kmin.min@samsung.com eunseog.cho@samsung.com., Cho E
Publikováno v:
Physical chemistry chemical physics : PCCP [Phys Chem Chem Phys] 2018 Apr 04; Vol. 20 (14), pp. 9045-9052.
Autor:
Cho E; Platform Technology Lab, Samsung Advanced Institute of Technology , 130 Samsung-ro, Suwon, Gyeonggi-do 16678, Republic of Korea., Seo SW; Platform Technology Lab, Samsung Advanced Institute of Technology , 130 Samsung-ro, Suwon, Gyeonggi-do 16678, Republic of Korea., Min K; Platform Technology Lab, Samsung Advanced Institute of Technology , 130 Samsung-ro, Suwon, Gyeonggi-do 16678, Republic of Korea.
Publikováno v:
ACS applied materials & interfaces [ACS Appl Mater Interfaces] 2017 Sep 27; Vol. 9 (38), pp. 33257-33266. Date of Electronic Publication: 2017 Sep 19.
Autor:
Min K; Platform Technology Lab, Samsung Advanced Institute of Technology, 130 Samsung-ro, Suwon, Gyeonggi-do, 443-803, Republic of Korea., Rammohan AR; Science and Technology Division, Corning Incorporated, One Science Center Drive, Corning, New York, 14831, United States., Lee HS; Platform Technology Lab, Samsung Advanced Institute of Technology, 130 Samsung-ro, Suwon, Gyeonggi-do, 443-803, Republic of Korea., Shin J; Platform Technology Lab, Samsung Advanced Institute of Technology, 130 Samsung-ro, Suwon, Gyeonggi-do, 443-803, Republic of Korea., Lee SH; Corning Technology Center Korea, Asan, Chungcheongnam-do, 31454, Republic of Korea., Goyal S; Science and Technology Division, Corning Incorporated, One Science Center Drive, Corning, New York, 14831, United States., Park H; Corning Technology Center Korea, Asan, Chungcheongnam-do, 31454, Republic of Korea., Mauro JC; Science and Technology Division, Corning Incorporated, One Science Center Drive, Corning, New York, 14831, United States., Stewart R; Science and Technology Division, Corning Incorporated, One Science Center Drive, Corning, New York, 14831, United States., Botu V; Science and Technology Division, Corning Incorporated, One Science Center Drive, Corning, New York, 14831, United States., Kim H; Corning Technology Center Korea, Asan, Chungcheongnam-do, 31454, Republic of Korea., Cho E; Platform Technology Lab, Samsung Advanced Institute of Technology, 130 Samsung-ro, Suwon, Gyeonggi-do, 443-803, Republic of Korea. eunseog.cho@samsung.com.
Publikováno v:
Scientific reports [Sci Rep] 2017 Sep 05; Vol. 7 (1), pp. 10475. Date of Electronic Publication: 2017 Sep 05.